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無庫存,下單後進貨(採購期約45個工作天)
Ion Beams and Nano-Engineering:VOLUME1181
定  價:NT$5859元
優惠價: 95273
可得紅利積點:158 點

無庫存,下單後進貨(採購期約45個工作天)

商品簡介

The 22 papers report on new research and applications of the technology, especially at the nanometer scale, as new facilities for precision ion beam processing come on line and more is understood about ion beam interactions with matter. They cover beam lithography, pattern formation, and nanowires; magnetic, optical, and semiconductor applications; nanostructure formation and fabrication of three-dimensional structures; interactions between ions and solids; and biological and biomedical applications. Among the topics of invited papers are localized gallium doping and cryogenic deep reaction ion etching in the fabrication of silicon nanostructures, fabricating micro-fluid-channel structures by focused ion-beam techniques, swift heavy ion irradiation induced effects in SiSiOx multi-layered films and nanostructures, quantum and classical molecular dynamics studies of the threshold displacement energy in silicon bulk and nanowire, and ion implantation as surface treatment for osseo-integration. Annotation c2010 Book News, Inc., Portland, OR (booknews.com)

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