Photosensitive resin composition for projection exposure, photosensitive element, method for forming resist pattern, process for producing printed wir
商品資訊
ISBN13:9798574909720
出版社:Independently published
作者:Masakazu Kume
出版日:2020/12/03
裝訂:平裝
規格:28cm*21.6cm*0.1cm (高/寬/厚)
商品簡介
相關商品
商品簡介
An object of the present invention is to provide a photosensitive resin composition for projection exposure capable of forming a resist pattern that is excellent in adhesion, resolution, and inhibitory properties against the occurrence of resist footing, and the present invention provides a photosensitive resin composition for projection exposure comprising (A) a binder polymer; (B) a photopolymerizable compound having an ethylenically unsaturated bond; (C) a photopolymerization initiator; and (D) a sensitizing dye, wherein the (B) photopolymerizable compound having an ethylenically unsaturated bond comprises a (meth)acrylate compound having a skeleton derived from dipentaerythritol and a compound represented by the following formula (III): ##STR00001## wherein R.sup.8, R.sup.9, R.sup.10, and R.sup.11 each independently represent a hydrogen atom or a methyl group, X and Y each independently represent an ethylene group or a propylene group, p.sub.1, p.sub.2, q.sub.1, and q.sub.2 each independently represent a numerical value of 0 to 9, both p.sub.1+q.sub.1 and p.sub.2+q.sub.2 are 1 or more, and p.sub.1+q.sub.1+p.sub.2+q.sub.2 is 2 to 9.
主題書展
更多
主題書展
更多書展今日66折
您曾經瀏覽過的商品
購物須知
外文書商品之書封,為出版社提供之樣本。實際出貨商品,以出版社所提供之現有版本為主。部份書籍,因出版社供應狀況特殊,匯率將依實際狀況做調整。
無庫存之商品,在您完成訂單程序之後,將以空運的方式為你下單調貨。為了縮短等待的時間,建議您將外文書與其他商品分開下單,以獲得最快的取貨速度,平均調貨時間為1~2個月。
為了保護您的權益,「三民網路書店」提供會員七日商品鑑賞期(收到商品為起始日)。
若要辦理退貨,請在商品鑑賞期內寄回,且商品必須是全新狀態與完整包裝(商品、附件、發票、隨貨贈品等)否則恕不接受退貨。