Low-Dielectric Constant Materials II:VOLUME443
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系列名:MRS Proceedings
ISBN13:9781558993471
出版社:CAMBRIDGE UNIVERSITY PRESS
作者:Edited by H. Treichel ; A. C. Jones ; A. Lagendijk ; K. Uram
出版日:1997/08/19
裝訂/頁數:平裝/203頁
版次:1
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Reflecting the global significance of the topic to the future of the semiconductor industry, workshop presentations (26 of the 35 are contained here) were given by manufacturers and chemical suppliers, as well as academics from several countries and government laboratories. Diversity is also reflected in the state-of-the-art approaches currently under investigation for the design, implementation, and optimization of low-k dielectric devices: e.g. the evolution of silicon dioxide to fluorinated silicate glass, the use of polymers, diamond-like carbon, and nanoporous silica. Annotation c. by Book News, Inc., Portland, Or.
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