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2025國際書展現場活動搶先看

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Edited by M. Doerner 、W. C. Oliver 、G. M. Pharr 、F. R. Brotzen (1)
M. R. Oliver (EDT) (1)
Tom R. Tyler (EDT)/ Roderick M. Kramer (EDT)/ Oliver P. John (EDT) (1)
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Cambridge University Press (1)
Springer Verlag (1)
Taylor & Francis (1)

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作者:M. R. Oliver (EDT)  出版社:Springer Verlag  出版日:2004/03/19 裝訂:精裝
This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussio
若需訂購本書,請電洽客服
02-25006600[分機130、131]。
Thin Films::Stresses and Mechanical Properties II:VOLUME188
90折
作者:Edited by M. Doerner ; W. C. Oliver ; G. M. Pharr ; F. R. Brotzen  出版社:Cambridge University Press  出版日:1990/10/29 裝訂:平裝
A compilation of papers presented at a symposium on [title] at the Spring Meeting of the Materials Research Society, in San Francisco, April 1990. The papers address topics in the areas of: stresses m
無庫存,下單後進貨(到貨天數約30-45天)
定價:2254 元, 優惠價:9 2029
作者:Tom R. Tyler (EDT); Roderick M. Kramer (EDT); Oliver P. John (EDT)  出版社:Taylor & Francis  出版日:1999/02/01 裝訂:精裝
Leading theoreticians and researchers present current thinking about the role played by group memberships in people's sense of who they are and what they are worth. The chapters build on the assumptio
若需訂購本書,請電洽客服
02-25006600[分機130、131]。

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