Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also
Contains 60 contributions comprising the proceedings of the April 1996 MRS symposium, held in San Francisco, covering a range of activity in the III-V compound semiconductor electronics and photonics
These facsimiles of 60 papers from the December 1997 symposium cover the subject areas of applications for power electronics, diamond-based devices, processing, materials, silicon carbide technology,
