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古典詩詞的女兒-葉嘉瑩

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2016年以前 (2)
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Edited by Duane S. Boning 、Johann W. Bartha 、Ara Philipossian 、Greg Shinn 、Ingrid Vos (1)
Edited by Duane S. Boning 、Katia Devriendt 、Michael R. Oliver 、David J. Stein 、Ingrid Vos (1)
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CAMBRIDGE UNIVERSITY PRESS (2)

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Chemical-Mechanical Planarization:VOLUME767
90折
作者:Edited by Duane S. Boning ; Katia Devriendt ; Michael R. Oliver ; David J. Stein ; Ingrid Vos  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2003/08/27 裝訂:平裝
The fabrication technology for advanced integrated circuits, affectionately known as CMP, continues to find application in novel devices at the same time that understanding is growing about the physic
無庫存,下單後進貨(到貨天數約30-45天)
定價:1665 元, 優惠價:9 1499
Advances in Chemical-Mechanical Polishing:VOLUME816
90折
作者:Edited by Duane S. Boning ; Johann W. Bartha ; Ara Philipossian ; Greg Shinn ; Ingrid Vos  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2005/03/21 裝訂:平裝
Already in widespread use in integrated circuit fabrication, chemical-mechanical polishing is beginning to appear in a wider range of applications. This work contains 37 papers originally presented at
無庫存,下單後進貨(到貨天數約30-45天)
定價:1665 元, 優惠價:9 1499

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